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Electronic Materials / Thin-Film Circuits

Precision Foundry Support from Layout Review to Finished Parts

HTK supports thin-film microcircuit foundry projects from substrate and layout review through deposition, photolithography, plating, precision profiling, inspection and selected assembly processes. The supplied capability includes high-precision passive circuits on ceramic, glass and specialty substrates.

Typical Project Types

Precision passive and mounting structures.

Passive

Resistors & Capacitors

Precision resistive networks and single-layer capacitive structures.

RF / Microwave

Filters & Couplers

Filters, couplers, power dividers and microstrip passive circuits.

Packaging

Mounting Substrates

Optical or semiconductor mounting substrates and custom metallization stacks.

Foundry Design Rules

Representative substrate, pattern and resistor capability.

Values are transcribed from the supplied foundry-service PDF for early design screening. Use the controlled capability confirmation issued for the actual project.

Swipe horizontally to view all specifications.

Area Representative capability Typical / minimum Notes
Substrate materials 99.6% alumina, AlN, fused quartz and BeO Ferrite, glass, sapphire, diamond and SiC also listed Material availability by project
Substrate thickness 0.127–1.016 mm standard set As-fired ±10%; polished ±10 µm Other thicknesses require review
Circuit size Maximum 100 × 100 mm Pattern-to-edge minimum 20 µm Layout-dependent
Line / space Typical 25 µm Minimum 10 µm Minimum tolerance ±3 µm; typical ±10 µm
Layer alignment Typical ±10 µm Confirm layer count and fiducials
Metallized vias Minimum aspect ratio 0.67:1 Minimum hole diameter 67% of substrate thickness Typical diameter equals substrate thickness
Resistors 10–200 Ω/□ nominal; 50 or 100 Ω/□ preferred Minimum L/W 0.05 mm; resistor spacing 0.05 mm Non-trimmed tolerance ±10% or ±5%

BeO and other specialty substrate projects require separate handling, compliance and safety review. Exact manufacturing limits are approved only after file and stack review.

Profiling & Metallization

Representative downstream processing capability.

Swipe horizontally to view all specifications.

Process Representative limit / option Typical materials Project note
Laser profiling Maximum substrate thickness 1.0 mm; feature tolerance ±30 µm Ceramic and selected specialty substrates Minimum laser-feature-to-pattern gap 30 µm
Dicing saw Maximum substrate 150 × 150 mm; thickness up to 2 mm Rectangular tile up to 127 × 127 mm; circular up to Φ150 mm Typical tolerance ±0.050 mm; minimum ±0.025 mm
Adhesion / barrier Ti, TiW, NiCr, Cr / TiW, Pt, Ni Stack selected by assembly process Reflow and bonding limits vary by stack
Conductor / resistor Cu or Au / NiCr or TaN Electrolytic Cu, Ni, Au typically 1–6 µm Pre-deposited AuSn typically 3–5 µm
Data format DWG, DXF or Gerber AutoCAD preferred; closed polylines Submit 1:1 geometry and stack notes

Representative foundry values from the supplied PDF. Current equipment window, metal thickness tolerance and assembly compatibility are confirmed with the drawing package.

Manufacturing Scope

Review the full stack and inspection requirement.

Submit DXF, DWG or an equivalent manufacturing drawing together with substrate, stack-up, line/space, tolerance, electrical and inspection requirements.

  • Sputtering and evaporation
  • Photolithography and patterning
  • Plating and metallization
  • Laser processing, dicing and edge features
  • Dimensional and electrical inspection
  • Assembly-process compatibility review

Quality & Release

Design limits and quality criteria are confirmed before production.

The supplied PDF references ISO-9000 quality-management specifications and MIL-STD-883C-type quality specifications. Applicability, certification scope, inspection plan and acceptance criteria must be confirmed for the actual supplying entity and project.

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